ASTM F1709-97(2016)

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Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

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Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

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ASTM F1709-97(2016)

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

Are the documents at the ANSI Webstore in electronic Adobe Acrobat PDF format only?

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