Clean Room

Semiconductor Fabrication Standards cover the production process of semiconductors. Given the importance of clean rooms, these standards address gas distribution in that context, as well as the use and quality of water. Additionally, IEC 62258 provides information about semiconductor die products. Other topics of importance are included as well, such as EM immunity, examination of semiconductors, and aerospace-specific requirements.

1.1 This standard specifies the dimensions of knife-edge style flanges and their associated gaskets used in vacuum systems for pressures ranging from 10 5 Pa to 10 -11 Pa. Such flanges are widely used throughout vacuum technology applications in semiconductor processing tools, surface analysis systems, space simulation systems, and general research requiring vacuum. 1.2 The values stated in either SI units or inch-pound units are to be regarded separately as standard. The values stated in each system may not be exact equivalents; therefore, each system shall be used independently of the other. Combining values from the two systems may result in non-conformance with the standard. 1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use. 1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.

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Clean Room

ASTM E2734/E2734M-10(2018)

Standard Specification for Dimensions of Knife-Edge Flanges